Siansonic Cover Type Megasonic Unit

Megasonic ultrasonic cleaner uses higher frequency ultrasonic energy in mega hertz scale to boost removal of submicron particles from substrates and chemical reactions. Compared to low frequency ultrasonic cavitations, megasonic cavitations effect can give smaller particles removal as well as less damage on the substrates.

Batch type megasonic transducer uses large megasonic transducer which can emit sound field with large area, then it can provide high cleaning efficiency. However, the distribution of sound field in the tank is not uniform. The intensity which is further way from the megasonic transducer is usually lower. And the transfer efficiency of sound power is low. Shower type megasonic wafer cleaning can directly focus the megasonic energy onto the substrate surface, consequently the sound field can distribute uniformly on the substrate surface by moving the substrate and megasonic nozzle. However, the flow rate of cleaning fluid required by shower type megasonic cleaning is quite high. Therefore it wastes cleaning fluid too much.

Cover type megasonic cleaning is an optimized meagsonic cleaning technology which has the advantages of both batch type and shower type megasonic cleaning equipment and removes the drawbacks of both types. It can directly transfer the megasonic energy with large area onto the substrate surface, has quite high uniformity of sound field as well as the transfer efficiency. Furthermore, cover type megasonic ultrasonic cleaner gives very high utilization of cleaning fluid.